Fig. 1. Experimental scheme of laser processing lines along the Z axis inside the oxyfluoride glass.

Fig. 2. EPMA mapping showing the distribution of (a)–(d) Ca2+ and (e)–(h) Yb3+ in the glass with different pulse energies. (a), (e) 2 μJ, (b), (f) 2.72 μJ, (c), (g) 3.12 μJ, (d), (h) 3.52 μJ.

Fig. 3. EPMA mapping showing the distribution of Si4+ in the glass with different pulse energies. (a) 2 μJ, (b) 2.72 μJ, (c) 3.12 μJ, (d) 3.52 μJ.

Fig. 4. (a), (c) EPMA mapping showing the distribution of Yb3+ ions in the glass with different pulse energies. (b) Confocal fluorescence spectrum obtained with a 785 nm laser as the excitation source. (d), (e) Different luminescence intensities at 975 nm as a function of distance. The special points a–l are presented clearly in (a) and (c).