Optics and Precision Engineering, Volume. 32, Issue 19, 2933(2024)

Rapid and uniform exposure control for wafer motion imaging system

Ruoyu WANG, Fuyang YAN, and Tundong LIU*
Author Affiliations
  • Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen361000, China
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    References(27)

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    Ruoyu WANG, Fuyang YAN, Tundong LIU. Rapid and uniform exposure control for wafer motion imaging system[J]. Optics and Precision Engineering, 2024, 32(19): 2933

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    Paper Information

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    Received: Jun. 19, 2024

    Accepted: --

    Published Online: Jan. 9, 2025

    The Author Email: Tundong LIU (ltd@xmu.edu.cn)

    DOI:10.37188/OPE.20243219.2933

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