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Chinese Journal of Lasers, Volume. 17, Issue 2, 95(1990)

Ni-SiO2-Si quasi MOS structural film formed by laser-induced surface chemical reaction

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]2
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Ni-SiO2-Si quasi MOS structural film formed by laser-induced surface chemical reaction[J]. Chinese Journal of Lasers, 1990, 17(2): 95

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    Received: Feb. 27, 1989

    Accepted: --

    Published Online: Nov. 12, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology