Analysis of the Influence of 2 m Plane Mirror on the Adjustment Error of Optical Path Eccentricity

Wang Xinrui; Yang Yongxing; Li Jinpeng; Lai Xinhua; Zeng Changyu; He Peng

doi:10.14128/j.cnki.al.20244406.168

APPLIED LASER, Volume. 44, Issue 6, 168(2024)

Analysis of the Influence of 2 m Plane Mirror on the Adjustment Error of Optical Path Eccentricity

Wang Xinrui^1,2, Yang Yongxing^1,2, Li Jinpeng^1,2,3、*, Lai Xinhua⁴, Zeng Changyu^1,2, and He Peng³

Author Affiliations

¹University of Science and Technology of China, Hefei 230022, Anhui, China

²Nanjing Research Center of Astronomical Instruments, University of Science and Technology of China, Nanjing 210042, Jiangsu, China

³Nanjing Astronomical Instruments Co., Ltd., Chinese Academy of Sciences, Nanjing 210042, Jiangsu, China

⁴Mathematics and Science College, Shanghai Normal University, Shanghai 200234, China

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References(4)

[1] [1] AN Q C, ZHANG J X, YANG F, et al. Ritchey-Common sparse-aperture testing of the giant steerable science mirror[J]. Applied Optics, 2018, 57(27): 7764-7769.

[2] [2] KIM G, SONG I U, PARK J G, et al. Dual subaperture stitching for large flat mirror testing[J]. Applied Optics, 2020, 59(28): 8681-8687.

[8] [8] ZHU S, ZHANG X H. Eliminating alignment error and analyzing Ritchey angle accuracy in Ritchey-Common test[J]. Optics Communications, 2013, 311: 368-374.

[15] [15] HAN S, NOVAK E, SCHURING M. Application of Ritchey-Common test in large flat measurements[J]. Proc. SPIE, 2001, 4399: 131-136.

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Wang Xinrui, Yang Yongxing, Li Jinpeng, Lai Xinhua, Zeng Changyu, He Peng. Analysis of the Influence of 2 m Plane Mirror on the Adjustment Error of Optical Path Eccentricity[J]. APPLIED LASER, 2024, 44(6): 168

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Paper Information

Category:

Received: Dec. 20, 2022

Accepted: Dec. 13, 2024

Published Online: Dec. 13, 2024

The Author Email: Jinpeng Li (lijinpeng@nairc.ac.cn)

DOI:10.14128/j.cnki.al.20244406.168

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology