Evolution and Application of Digital Micromirror Device Based Maskless Photolithography

Ziyi Zhou; Xianzi Dong; Meiling Zheng

doi:10.3788/LOP202259.0922030

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922030(2022)

Evolution and Application of Digital Micromirror Device Based Maskless Photolithography

Ziyi Zhou^1,2, Xianzi Dong^1、**, and Meiling Zheng^1、*

¹CAS Key Laboratory of Bio-Inspired Materials and Interfacial Science, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

²School of Future Technology, University of Chinese Academy of Sciences, Beijing 101407, China

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Ziyi Zhou, Xianzi Dong, Meiling Zheng. Evolution and Application of Digital Micromirror Device Based Maskless Photolithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922030

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Paper Information

Category: Optical Design and Fabrication

Received: Mar. 1, 2022

Accepted: Mar. 24, 2022

Published Online: May. 10, 2022

The Author Email: Xianzi Dong (dongxianzi@mail.ipc.ac.cn), Meiling Zheng (zhengmeiling@mail.ipc.ac.cn)

DOI:10.3788/LOP202259.0922030

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology