Fig. 1. Photo⁃sensitive region structure of traditional CCD

Fig. 2. Transmittance curves of different silicon nitride thicknesses

Fig. 3. Transmittance curves of different silicon oxide thicknesses

Fig. 4. Linear CCD response without HAD structure

Fig. 5. Linear CCD response with HAD structure

Fig. 6. Results of ion-implant with different dose and energy

Fig. 7. Results of ion-implant after optimizing the energy and dose

Fig. 8. SEM pictures before and after silicon nitride etching

Fig. 9. Result of optimization of silicon nitride etching

Fig. 10. The photo of ultraviolet linear CCD