Fig. 1. Schematic diagram of configuration for discharge chamber of 2 cm ECRIT ion source.2 cm ECRIT离子源放电室示意图

Fig. 2. Distribution of magnetic flux density inside of the discharge chambers:　(a) Chamber 1; (b) chamber 2; (c) chamber 3; (d) chamber 4.放电室内磁场分布　(a) 1号放电室; (b) 2号放电室; (c) 3号放电室; (d) 4号放电室

Fig. 3. Distribution of microwave electric field intensity inside of discharge chamber 4: (a) L₁ = 2.1 mm, L₂ = 0.7 mm; (b) L₁ = 2.5 mm, L₂ = 0.7 mm; (c) L₁ = 2.9 mm, L₂ = 0.7 mm. 不同天线位置下4号放电室内微波电场分布　(a) L₁ = 2.1 mm, L₂ = 0.7 mm; (b) L₁ = 2.5 mm, L₂ = 0.7 mm; (c) L₁ = 2.9 mm, L₂ = 0.7 mm

Fig. 4. Distribution of electron heating index in ECR layer of different discharge chambers: (a) Chamber 1; (b) chamber 2; (c) chamber 3; (d) chamber 4.不同放电室在ECR区的电子获能指标分布　(a) 1号; (b) 2号; (c) 3号; (d) 4号

Fig. 5. Schematic of the experimental system.实验系统图

Fig. 6. Ion beam current of four ion sources at fixed antenna position.固定天线位置下四种离子源引出的离子束流

Fig. 7. Ion beam current of ion source 4 at different antenna position: (a) L₁ = 2.1 mm, L₂ = 0.7 mm; (b) L₁ = 2.5 mm, L₂ = 0.7 mm; (c) L₁ = 2.9 mm, L₂ = 0.7 mm. 不同的天线位置下4号离子源的离子束流引出实验结果　(a) L₁ = 2.1 mm, L₂ = 0.7 mm; (b) L₁ = 2.5 mm, L₂ = 0.7 mm; (c) L₁ = 2.9 mm, L₂ = 0.7 mm

Fig. 8. Voltage for electron extraction vs. electron beam current from different neutralizers: (a) No.1; (b) No.2; (c) No.3; (d) No.4. 电子引出电压随电子束流的变化　(a) 1号中和器; (b) 2号中和器; (c) 3号中和器; (d) 4号中和器

Fig. 9. Electron extraction results of neutralizer 2 with different L₁ at P_i = 1 W. 不同L₁尺寸下2号中和器在P_i = 1 W时的电子引出结果

Fig. 10. Ion beam current at the neutralization state.中和时引出离子束流变化规律

Fig. 11. The coupling voltage of neutralizer at the neutraliza-tion state.中和时中和器耦合电压变化规律