Chinese Journal of Lasers, Volume. 52, Issue 17, 1704002(2025)
Calculation Method of Alignment Mark Position Deviation and Analysis of Process Adaptability
Fig. 1. Schematic diagrams of self-referencing interferometer alignment measurement. (a) Schematic diagram of optical path of self-referencing interferometer alignment system; (b) schematic diagram of optical path of self-referencing interferometer prism
Fig. 6. Schematic diagrams of asymmetric deformation marker structure. (a) Top deformation; (b) floor deformation; (c) sidewall deformation
Fig. 7. Effects of layer number on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
Fig. 8. Effects of top asymmetric deformation on APD and WQ. (a) APD versus
Fig. 9. Effects of bottom asymmetric deformation on APD and WQ. (a) APD versus
Fig. 10. Effects of sidewall asymmetric deformation on APD and WQ. (a) APD versus
Fig. 11. Effects of grating groove depth on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
Fig. 12. Effects of duty cycle on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
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Xiaoshan Li, Jiani Su, Yuejing Qi, Zhipeng Wu, Junhua Zhao. Calculation Method of Alignment Mark Position Deviation and Analysis of Process Adaptability[J]. Chinese Journal of Lasers, 2025, 52(17): 1704002
Category: Measurement and metrology
Received: Feb. 28, 2025
Accepted: Apr. 24, 2025
Published Online: Sep. 13, 2025
The Author Email: Jiani Su (sujiani@ime.ac.cn), Yuejing Qi (qiyuejing@ime.ac.cn)
CSTR:32183.14.CJL250559