Chinese Journal of Lasers, Volume. 52, Issue 17, 1704002(2025)

Calculation Method of Alignment Mark Position Deviation and Analysis of Process Adaptability

Xiaoshan Li1,2, Jiani Su1,2、*, Yuejing Qi1,2、**, Zhipeng Wu1,2, and Junhua Zhao1,2
Author Affiliations
  • 1New Technology Development Department, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(13)
    Schematic diagrams of self-referencing interferometer alignment measurement. (a) Schematic diagram of optical path of self-referencing interferometer alignment system; (b) schematic diagram of optical path of self-referencing interferometer prism
    Schematic diagram of beam diffraction for ideal alignment mark
    Schematic diagram of beam diffraction for asymmetric alignment mark
    Schematic diagram for layered processing of alignment mark
    Flow chart of APD calculation
    Schematic diagrams of asymmetric deformation marker structure. (a) Top deformation; (b) floor deformation; (c) sidewall deformation
    Effects of layer number on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
    Effects of top asymmetric deformation on APD and WQ. (a) APD versus Δhtop; (b) WQ versus Δhtop
    Effects of bottom asymmetric deformation on APD and WQ. (a) APD versus Δhfloor; (b) WQ versus Δhfloor
    Effects of sidewall asymmetric deformation on APD and WQ. (a) APD versus Δx; (b) WQ versus Δx
    Effects of grating groove depth on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
    Effects of duty cycle on APD and WQ. (a)(b) Top deformation; (c)(d) floor deformation; (e)(f) sidewall deformation
    • Table 1. Simulation parameters of alignment mark model

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      Table 1. Simulation parameters of alignment mark model

      ParameterContent
      Wavelength /nm532,633,780,852
      Polarization stateTE and TM
      Mark pitch /μm3.2
      Asymmetric deformation amount /nm1‒5
      Groove depth /nm100‒400
      Duty cycle0.1‒0.9
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    Xiaoshan Li, Jiani Su, Yuejing Qi, Zhipeng Wu, Junhua Zhao. Calculation Method of Alignment Mark Position Deviation and Analysis of Process Adaptability[J]. Chinese Journal of Lasers, 2025, 52(17): 1704002

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    Paper Information

    Category: Measurement and metrology

    Received: Feb. 28, 2025

    Accepted: Apr. 24, 2025

    Published Online: Sep. 13, 2025

    The Author Email: Jiani Su (sujiani@ime.ac.cn), Yuejing Qi (qiyuejing@ime.ac.cn)

    DOI:10.3788/CJL250559

    CSTR:32183.14.CJL250559

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