Opto-Electronic Science, Volume. 3, Issue 10, 230035-1(2024)

Supercritical metalens at h-line for high-resolution direct laser writing

Jichao Fu、†, Mengting Jiang、†, Zeng Wang, Yi Fan Chen, Yuanda Liu, Qing Yang Steve Wu, Ai Jia Sim, Jiang Wang, Mingxi Chen, Ziyu Wang, Jie Deng, Xiao Song Eric Tang, Kun Huang, Hong Liu, and Jinghua Teng*
Figures & Tables(4)
Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view. (d) The amplitude and phase profile in transmission mode of the AlN unit cell with varying pillar diameters. PH, pinhole; AT, attenuator; M1, M2, M3, mirrors; LP, linear polarizer; CL, conventional lens; ML, metalens; PR, photoresist.
Design and fabrication of SCLs and FZL. Optical images of (a) SCL05 (the ratio of the intensities of the first side lobe and the central peak is 5%), (b) SCL10 (the ratio of the intensities of the first side lobe and the central peak is 10%). (c) Scanning electron microscopy (SEM) images of the FZL after all experiments and coated with a thin layer of gold. (d) Schematic diagram of an enlarged region in (a). (e) The efficiency of SCL05 with other possible selections of units “0” and “1”. In this more general case, the unit “0” is assumed to have a transmission coefficient of t0= 1, and the unit “1” can have any physically reasonable transmission coefficient with transmission amplitude ≤1 and phase between 0 and 2π. The horizontal and vertical axes are the real and imaginary parts of the transmission coefficient of the permitted unit “1”, respectively. (f) The changes of FWHM and efficiency of SCL05 when the unit “1” evolves from point P (t = 1) to point Q (t = −1) through the binary phase (BP) path in (e). The black dashed line indicates the unit “1” adopted in the final designs.
Focusing characteristics of the FZL and SCLs. (a–c) Intensities at x-z plane calculated by the vectorial diffraction formula. (d–f) Intensities measured. (g–i) Normalized intensities along x crossing the maximums (dashed black lines for analytic and solid blue lines for measured results) of which positions indicated by the blue dashed lines in (a-f). The calculated values of FWHMs are explicitly labelled. (a, d, g) correspond to FZL, (b, e, h) correspond to SCL05 and (c, f, i) correspond to SCL10.
Grating patterns generated by the FZL- and SCL-based DLW. (a–c) SEM images of the grating patterns, from left to right, with pitches of 680, 650, 620, 590 and 560 nm and a length of 4 μm written by the FZL (a), SCL05 (b) and SCL10 (c). (d–f) Measured height information by AFM (atomic force microscopy) along the positions indicated by the red dashed lines in (a–c).
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Jichao Fu, Mengting Jiang, Zeng Wang, Yi Fan Chen, Yuanda Liu, Qing Yang Steve Wu, Ai Jia Sim, Jiang Wang, Mingxi Chen, Ziyu Wang, Jie Deng, Xiao Song Eric Tang, Kun Huang, Hong Liu, Jinghua Teng. Supercritical metalens at h-line for high-resolution direct laser writing[J]. Opto-Electronic Science, 2024, 3(10): 230035-1

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Paper Information

Category: Research Articles

Received: Sep. 30, 2023

Accepted: Dec. 25, 2023

Published Online: Jan. 2, 2025

The Author Email: Jinghua Teng (JHTeng)

DOI:10.29026/oes.2024.230035

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