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Chinese Optics Letters, Volume. 21, Issue 4, 041404(2023)

Watt-level laser operation of Pr3+:YLF at 696 and 698 nm

Weihang Cao1,2, Zhengdong Dai1,2, Run Fang1,2,3, Zhongyu Wang1,2, Yuchen Xue1,2, Bo Xiao1,2, Huiying Xu1,2, and Zhiping Cai1,2、*
Author Affiliations
  • 1Department of Electronic Engineering, Xiamen University, Xiamen 361005, China
  • 2Fujian Key Laboratory of Ultrafast Laser Technology and Applications, Xiamen University, Xiamen 361005, China
  • 3School of Physics and Electronic Science, Guizhou Normal University, Guiyang 550001, China
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    Schematic experimental setup of the LD-pumped Pr3+:YLF CW laser.

    Fig. 1. Schematic experimental setup of the LD-pumped Pr3+:YLF CW laser.

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    Transmission curve of IM and OC.

    Fig. 2. Transmission curve of IM and OC.

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    Partial energy level scheme of Pr3+:YLF crystal.

    Fig. 3. Partial energy level scheme of Pr3+:YLF crystal.

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    Laser output performance at 698.6 and 696.6 nm. (a), (c) Experimental input–output relationship and simulation results; (b), (d) laser emission spectra of 698.6 and 696.6 nm.

    Fig. 4. Laser output performance at 698.6 and 696.6 nm. (a), (c) Experimental input–output relationship and simulation results; (b), (d) laser emission spectra of 698.6 and 696.6 nm.

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    (a), (b) Measured corresponding M2 factors of 696.6 and 698.6 nm, respectively; (c), (d) power stabilities of lasers at 696.6 and 698.6 nm.

    Fig. 5. (a), (b) Measured corresponding M2 factors of 696.6 and 698.6 nm, respectively; (c), (d) power stabilities of lasers at 696.6 and 698.6 nm.

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    • Table 1. Parameters Used in the Simulation of Lasers at 698 and 696 nm

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      Table 1. Parameters Used in the Simulation of Lasers at 698 and 696 nm

      λ (nm)σe (10-20 cm2)Isat (mW/µm2)ϖp (µm)γT (%)
      6961.515.106750.01550.42
      6989.790.7851080.0231.55
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    Weihang Cao, Zhengdong Dai, Run Fang, Zhongyu Wang, Yuchen Xue, Bo Xiao, Huiying Xu, Zhiping Cai, "Watt-level laser operation of Pr3+:YLF at 696 and 698 nm," Chin. Opt. Lett. 21, 041404 (2023)

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    Paper Information

    Category: Lasers, Optical Amplifiers, and Laser Optics

    Received: Oct. 29, 2022

    Accepted: Dec. 6, 2022

    Published Online: Mar. 17, 2023

    The Author Email: Zhiping Cai (zpcai@xmu.edu.cn)

    DOI:10.3788/COL202321.041404

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology