Chinese Optics, Volume. 18, Issue 2, 256(2025)

Damage mechanism of back-illuminated CMOS image sensor irradiated by pulsed laser

Fang QIAN1, Jia-qi PENG2, and Yong-bo XU3、*
Author Affiliations
  • 1China Academy of Electronics and Information Technology, Beijing 100041, China
  • 2Army Armaments Department, Changchun 130033, China
  • 3Suzhou Everbright Photonics Co., Ltd, Suzhou 215100, China
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    Figures & Tables(19)
    The two-dimensional structure of the back-illuminated CMOS image sensor
    Radiation results of 532 nm nanosecond single pulse laser. (a) Temperature distribution; (b) maximum temperature change in each layer
    Radiation results of 1064 nm nanosecond single pulse laser. (a) Temperature distribution; (b) maximum temperature change in each layer
    Radiation results of 532 nm picosecond single pulse laser. (a) Temperature distribution; (b) maximum temperature change in each layer
    Radiation results of 1064 nm picosecond single pulse laser. (a) Temperature distribution; (b) maximum temperature change in each layer
    Experimental block of CMOS image sensor irradiated with 532 nm nanosecond single pulse laser
    Light path of CMOS image sensors irradiated by 532 nm nanosecond single pulse laser
    Damage condition of CMOS image sensors irradiated by 532 nm nanosecond single pulse laser. From left to right, the laser energy densities are 28.95 mJ/cm2, 69.91 mJ/cm2, 167.6 mJ/cm2, 519.3 mJ/cm2, respectively
    Experimental principle of CMOS image sensor irradiated with 1064 nm nanosecond single pulse laser
    Light path of CMOS image sensor irradiated with 1064 nm nanosecondsingle pulse laser
    Damage condition of CMOS image sensors irradiated by 1064 nm nanosecond single pulse laser. From left to right, the laser energy densities are 40.79 mJ/cm2, 100.6 mJ/cm2, 132.4 mJ/cm2, 1.24 J/cm2, respectively
    Experimental principle of CMOS image sensor irradiated with picosecond single pulse laser
    Light path of CMOS image sensor irradiated with single pulse picosecond laser
    Damage condition of CMOS image sensor irradiated by 532 nm picosecond pulse laser. From left to right, the laser energy densities are 18.95 mJ/cm2, 78.93 mJ/cm2, 120.49 mJ/cm2, 501.33 mJ/cm2, respectively
    Damage condition of CMOS image sensor irradicatd by 1064 nm picosecond pulse laser. From left to right, the laser energy densities are 19.71 mJ/cm2, 90.76 mJ/cm2, 123.80 mJ/cm2, 566.19 mJ/cm2, respectirely
    Comparison between simulation results and experimental results of point damage threshold
    • Table 1. Thermodynamic parameters of materials

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      Table 1. Thermodynamic parameters of materials

      PISiAl
      密度/(kg·m−3)119023292700
      导热系数/(W·m−1K−1)0.327238
      热膨胀系数(1/K)2×10−52.6×10−623×10−6
      恒压热容/(J·kg−1·K−2)1510700900
      杨氏模量(Pa)3.2×109170×10970×109
      泊松比0.350.280.33
      熔点(K)7101685932
    • Table 2. Point damage thresholds under various laser parameters

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      Table 2. Point damage thresholds under various laser parameters

      单脉冲激光点损伤阈值/(mJ·cm−2
      532 nm,1 ns61.12
      1064 nm,1 ns75.76
      532 nm,30 ps31.83
      1064 nm,30 ps37.43
    • Table 3. Damage thresholds for each stage

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      Table 3. Damage thresholds for each stage

      点损伤线损伤功能性损伤致盲
      注:激光能量密度单位为mJ/cm2
      纳秒532 nm28.9569.91167.6519.3
      1064 nm40.79100.6132.41.24×103
      皮秒532 nm18.9578.93120.49501.33
      1064 nm19.7190.76123.80566.19
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    Fang QIAN, Jia-qi PENG, Yong-bo XU. Damage mechanism of back-illuminated CMOS image sensor irradiated by pulsed laser[J]. Chinese Optics, 2025, 18(2): 256

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    Paper Information

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    Received: Aug. 1, 2024

    Accepted: Oct. 22, 2024

    Published Online: May. 19, 2025

    The Author Email:

    DOI:10.37188/CO.2024-0139

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