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Acta Optica Sinica, Volume. 36, Issue 8, 812001(2016)

Process Dependency of Focusing and Leveling Measurement System in Nanoscale Lithography

Sun Yuwen1,2、*, Li Shiguang1, Ye Tianchun1, and Zong Mingcheng1
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  • 2[in Chinese]
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    Article index updated: Sep. 10, 2025

    The article is cited by 7 article(s) CLP online library. (Some content might be in Chinese.)
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    Sun Yuwen, Li Shiguang, Ye Tianchun, Zong Mingcheng. Process Dependency of Focusing and Leveling Measurement System in Nanoscale Lithography[J]. Acta Optica Sinica, 2016, 36(8): 812001

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Mar. 8, 2016

    Accepted: --

    Published Online: Aug. 18, 2016

    The Author Email: Sun Yuwen (sunyuwen@ime.ac.cn)

    DOI:10.3788/aos201636.0812001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology