Opto-Electronic Engineering, Volume. 30, Issue 3, 13(2003)

Fabrication of Continuous Surface Micro-Optical Elements Using Deep Etching Technology

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    References(1)

    [6] [6] ZHOU Changhe, XI Peng, DAI Enwen et. al. Phase gratings made with inductively coupled plasma technology [J]. SPIE, 2001, 4470: 138-145.

    CLP Journals

    [1] ZHANG Wei-guo, DONG Xiao-chun, DU Chun-lei. Zooming Method for Microlens Array Imaging Photolithography[J]. Opto-Electronic Engineering, 2010, 37(3): 39

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Continuous Surface Micro-Optical Elements Using Deep Etching Technology[J]. Opto-Electronic Engineering, 2003, 30(3): 13

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    Paper Information

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    Received: Dec. 19, 2002

    Accepted: --

    Published Online: Nov. 14, 2007

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