OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 23, Issue 2, 56(2025)

Effect of Different Etching Solutions on Residual Salt on Polished Fused Silica Surface

WANG Chan, BAI Jun-jie, LI Qian-tao, LIU Jun-han, and XIONG Chang-xin
Author Affiliations
  • Huazhong Institute of Electro-Optics — Wuhan National Laboratory for Optoelectronics,Wuhan 430223,China
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    References(4)

    [2] [2] Suratwala T I, Miller P E, Bude J D, et al. HF-based etching processes for improving laser damage resistance of fused silica optical surfaces[J]. J Am. Ceram. Soc., 2011, 94(2):416-428.

    [4] [4] Bude J, Miller P, Baxamusa S, et al. High fluence laser damage precursors and their mitigation in fused silia[J]. Opt Express, 2014, 22(5):5839-5851.

    [5] [5] Baxamusa S, Miller P E, Wong L, et al. Mitigation of organic laser damage precursors from chemical processing of fused silica[J]. Opt. Express, 2014, 22(24):29568-29577.

    [11] [11] Spierings G. Wet chemical etching of silicate glasses in hydrofluoric acid based solutions[J]. Journal of Materials Science, 1993, 28(23):6261-6273.

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    WANG Chan, BAI Jun-jie, LI Qian-tao, LIU Jun-han, XIONG Chang-xin. Effect of Different Etching Solutions on Residual Salt on Polished Fused Silica Surface[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2025, 23(2): 56

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    Paper Information

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    Received: Aug. 23, 2024

    Accepted: Apr. 18, 2025

    Published Online: Apr. 18, 2025

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