Fig. 1. Schematic of the ODLCD sample processing. ODLCD includes two glass substrates，SD1 photo-alignment layer，PI alignment layer，and LCs layer. The NiO nanoparticles were dispersed in SD1 photo-alignment layer.

Fig. 2. （a）Chemical structure of the SD1；（b）Schematic of ODLCD in which two alignment domains with PA and TN domains；（c）Digital photographs with a “DHU” pattern between the analyzer and polarizer；（d）XRD θ-2θ spectra of the as-prepared NiO nanoparticles；（e）TEM image of NiO nanoparticles dispersed in SD1 solution.

Fig. 3. SEM images of the different SD1-NiO solutions on glass substrates.（a）1∶0；（b）1∶0.02；（c）1∶0.04；（d）1∶0.06；（e）1∶0.08；（f）1∶0.1.

Fig. 4. AFM surface morphology images for different SD1-NiO concentration，the inset are three-dimensional images.（a）1∶0；（b）1∶0.03；（c）1∶0.06；（d）1∶0.09.

Fig. 5. （a）Schematic of rewriting time measurement of ODLCD samples；（b）Comparison of trends between the average rewriting time and the reciprocal of absorbance at 450 nm for 11 different SD1-NiO ratios.

Fig. 6. （a）Response time of ODLCD under 5~10 V driving voltage；（b）Response time of ODLCD under 6 V driving voltage for different SD1-NiO ratio.