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Acta Optica Sinica, Volume. 39, Issue 9, 0911003(2019)

Effects of Dynamic Factors on Ensquared Energy in Gene Sequencing System

Zhiyuan Sun1、** and Wanyu Li2、*
Author Affiliations
  • 1 Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, Jilin 130033, China
  • 2 Hepatology Department,The First Hospital of Jilin University, Changchun, Jilin 130061, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (12)
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    References (29)
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    Figures & Tables(12)
    Sequencing process

    Fig. 1. Sequencing process

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    Imaging process based on optical platform

    Fig. 2. Imaging process based on optical platform

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    Model of image degeneration

    Fig. 3. Model of image degeneration

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    Flow chart of algorithm

    Fig. 4. Flow chart of algorithm

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    Photograph of sequencing platform

    Fig. 5. Photograph of sequencing platform

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    Dynamic parameter measurement schematic based on DMI system

    Fig. 6. Dynamic parameter measurement schematic based on DMI system

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    PSF measurement of sequencing system. (a) Image of processing chip; (b) PSF of sequencing system

    Fig. 7. PSF measurement of sequencing system. (a) Image of processing chip; (b) PSF of sequencing system

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    DNB image captured at static condition

    Fig. 8. DNB image captured at static condition

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    Distribution of position standard deviation

    Fig. 9. Distribution of position standard deviation

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    Ensquared energy

    Fig. 10. Ensquared energy

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    DNB image captured at dynamic status

    Fig. 11. DNB image captured at dynamic status

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    • Table 1. Proportion of different ranges

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      Table 1. Proportion of different ranges

      Range oflocation STD /nmNumber relative to all frames /%
      <604.47
      60-8017.39
      80-10024.72
      100-12020.50
      120-14015.16
      140-1609.19
      >1608.57
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    Zhiyuan Sun, Wanyu Li. Effects of Dynamic Factors on Ensquared Energy in Gene Sequencing System[J]. Acta Optica Sinica, 2019, 39(9): 0911003

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    Paper Information

    Category: Imaging Systems

    Received: Feb. 20, 2019

    Accepted: May. 23, 2019

    Published Online: Sep. 9, 2019

    The Author Email: Sun Zhiyuan (15843047922@163.com), Li Wanyu (liwanyu2006@163.com)

    DOI:10.3788/AOS201939.0911003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology