Acta Optica Sinica, Volume. 20, Issue 5, 691(2000)

Profile Control of Continuous Relief MOE in Photoresist

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]2, and [in Chinese]2
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  • 2[in Chinese]
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    References(6)

    [1] [1] Veldcamp W B.Overview of micro-optics: past,present and future.Proc.SPIE,1991,1544:287~301

    [3] [3] Gale M T,Rossi M.Fabrication of continuous-relief micro-optical elements by direct laser writing in photo-resists.Opt.Engng.,1994,33(11):3556~3566

    [4] [4] Daly D,Stevens R F,Hutly M C.The manufacture of microlenses by melting photoresist.Measur.Sci.& Technol.,1990,1:323~326

    [5] [5] Smith H M.Holographic Recording Materials.New York: Springer-Verlag Berlin Heidelberg,1977.209~213

    [7] [7] Chen Bo,Guo Lürong.Refractive microlens array with parabolic section profile and no dead area.Proc.SPIE,1996,2866:420~423

    [8] [8] Suleski T J,O′Shea D C.Gray scale masks for diffractive-optics fabrication.Appl.Opt.,1995,34(32):7507~7526

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Profile Control of Continuous Relief MOE in Photoresist[J]. Acta Optica Sinica, 2000, 20(5): 691

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Nov. 9, 1998

    Accepted: --

    Published Online: Aug. 9, 2006

    The Author Email:

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