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Laser & Optoelectronics Progress, Volume. 57, Issue 15, 153101(2020)

Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band

Dongmei Liu1, Pengfei Yue1、*, Xiuhua Fu1, Hongyu Cao1, Jing Zhang1, and Shuang Li2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Optorun (shanghai) Co., Ltd., Shanghai 200444, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (12)
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    References (16)
    Cited By (3)
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    Figures & Tables(12)
    Diagram of effective interface method

    Fig. 1. Diagram of effective interface method

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    Refractive index of two materials. (a) SiO2; (b) SixNy

    Fig. 2. Refractive index of two materials. (a) SiO2; (b) SixNy

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    Single-sided reflectivity test curves under different N2 gas flow

    Fig. 3. Single-sided reflectivity test curves under different N2 gas flow

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    Sensitivity distribution of the film

    Fig. 4. Sensitivity distribution of the film

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    Comparison of design and test curves

    Fig. 5. Comparison of design and test curves

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    Extinction coefficient of SixNy monolayer film

    Fig. 6. Extinction coefficient of SixNy monolayer film

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    • Table 1. Process parameters

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      Table 1. Process parameters

      MaterialTG1/2-SiICP*2
      Power /kWAr /sccmPower /kWAr /sccmO2 /sccmN2 /sccm
      SixNy122005800100
      SiO2121005802200

    • Table 2. Hardness of different samples

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      Table 2. Hardness of different samples

      SampleP /%Hardness /GPa
      131.757.88
      246.189.13
      374.2815.12

    • Table 3. SixNy film hardness under different N2 inflation

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      Table 3. SixNy film hardness under different N2 inflation

      Gas flow /sccmHardness /GPa
      7517.93
      10018.58
      12520.36
      15020.95
      17520.77
      20018.71

    • Table 4. Process parameters of N2 gradient test

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      Table 4. Process parameters of N2 gradient test

      MaterialTG1/2-SiICP*2
      Power /kWAr /sccmPower /kWAr /sccmO2 /sccmN2 /sccm
      SixNy122005800125-175
      SiO2121005802200

    • Table 5. Film hardness under different N2 inflation

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      Table 5. Film hardness under different N2 inflation

      SampleGas flow /sccmHardness /GPa
      512515.99
      615016.06
      717515.42

    • Table 6. Actual physical thickness of each film after adjustment

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      Table 6. Actual physical thickness of each film after adjustment

      Layer number1234567891011
      MaterialSiO2SixNySiO2SixNySiO2SixNySiO2SixNySiO2SixNySiO2
      Thickness /nm7.9715.6638.8144.0112.6482.008.00180.008.00148.4887.34
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    Dongmei Liu, Pengfei Yue, Xiuhua Fu, Hongyu Cao, Jing Zhang, Shuang Li. Preparation of SixNy/SiO2 Hard Antireflection Film in Visible Light Band[J]. Laser & Optoelectronics Progress, 2020, 57(15): 153101

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    Paper Information

    Category: Thin Films

    Received: Nov. 8, 2019

    Accepted: Dec. 5, 2019

    Published Online: Aug. 4, 2020

    The Author Email: Pengfei Yue (yuepengfeifilm@126.com)

    DOI:10.3788/LOP57.153101

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology