Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine

Weilin Cheng; Fang Zhang; Dongliang Lin; Aijun Zeng; Baoxi Yang; Huijie Huang

doi:10.3788/AOS201838.1022004

Acta Optica Sinica, Volume. 38, Issue 10, 1022004(2018)

Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine

Weilin Cheng^1,2、*, Fang Zhang¹, Dongliang Lin^1,2, Aijun Zeng^1,2, Baoxi Yang^1,2, and Huijie Huang^1,2、*

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine[J]. Acta Optica Sinica, 2018, 38(10): 1022004

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 31, 2018

Accepted: May. 21, 2018

Published Online: May. 9, 2019

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DOI:10.3788/AOS201838.1022004

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