Chinese Journal of Lasers, Volume. 48, Issue 21, 2103001(2021)

Large Thickness Yttrium Fluoride Thin Films Deposited at Room Temperature

Changyang Liu1,2,3, Yunxia Jin1,3,4、*, Hongchao Cao1,3, Fanyu Kong1,3, Yonglu Wang1,3, and Jianda Shao1,3,4
Author Affiliations
  • 1Thin Film Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 4CAS Center for Excellence in Ultra-intense Laser Science, Shanghai 201800, China
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    Figures & Tables(11)
    XRD patterns of the yttrium fluoride films deposited under 150, 200, and 250 W and target
    XPS spectra for the surface of the yttrium fluoride films deposited under 150, 200, and 250 W
    Fine spectra of the Y 3d core level for the films and the fitted XPS spectra of the Y 3d core level under different powers. (a) Fine spectra of thin films; (b) fitted spectra under 150 W; (c) fitted spectra under 200 W; (d) fitted spectra under 250 W
    Transmittance spectra of the deposited yttrium fluoride films and germanium substrate
    Extinction coefficient curves of yttrium fluoride films deposited under 150, 200, and 250 W
    Refractive index curves of yttrium fluoride films deposited under 150, 200, and 250 W
    Transmittance spectra of experimental and fitted data for yttrium fluoride films deposited under different powers. (a) 150 W; (b) 200 W; (c) 250 W
    Surface morphologies of yttrium fluoride films deposited under different powers. (a) 150 W; (b) 200 W; (c) 250 W
    • Table 1. Thickness of YF3 thin film

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      Table 1. Thickness of YF3 thin film

      Power /WTime /hThickness /nm
      15051203
      20041141
      25031012
    • Table 2. Distribution of element in the deposited YF3 films

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      Table 2. Distribution of element in the deposited YF3 films

      Power /WRF /%RY /%RO /%RF/RY
      15059.5229.279.592.03
      20068.1923.505.742.90
      25069.1323.595.192.93
    • Table 3. RMS roughness and TIS values of films

      View table

      Table 3. RMS roughness and TIS values of films

      Power /WRMS roughness /nmTIS (λ=4.6 μm)
      1501.571.84×10-6
      2001.271.73×10-6
      2501.160.91×10-6
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    Changyang Liu, Yunxia Jin, Hongchao Cao, Fanyu Kong, Yonglu Wang, Jianda Shao. Large Thickness Yttrium Fluoride Thin Films Deposited at Room Temperature[J]. Chinese Journal of Lasers, 2021, 48(21): 2103001

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    Paper Information

    Category: materials and thin films

    Received: Feb. 4, 2021

    Accepted: Apr. 9, 2021

    Published Online: Oct. 18, 2021

    The Author Email: Jin Yunxia (yxjin@siom.ac.cn)

    DOI:10.3788/CJL202148.2103001

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