Open-Type Retro-Reflectors with High Reflectivity Using TracePro

Fig. 5. Reflecting illuminance of glass micro-bead with refractive index of 2.00 on ordinary substrate. (a) Incident angle of 0°; (b) incident angle of 15°

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$Refracting illuminance of glass micro-bead with refractive index of 2.00 on high-reflectivity substrate. (a) Incident angle of 0°; (b) incident angle of 30°$

Fig. 6. Refracting illuminance of glass micro-bead with refractive index of 2.00 on high-reflectivity substrate. (a) Incident angle of 0°; (b) incident angle of 30°

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Fig. 7. Position of retro-reflective spot as a function of incident angle

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Fig. 8. Comparison between spectral reflectivities of single-layer aluminum film and aluminum+dielectric films

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Fig. 9. Theoretically designed curve of reflectivity

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Fig. 10. Comparison between theoretically designed and tested curves of reflectivity

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Fig. 11. Firmness testing result

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Fig. 12. Reflections of sample of high-reflectivity substrate illuminated by incandescent lamp

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Fig. 13. Scanning electron microscope image of samples of glass micro-beads

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Table 1. Surface reflectivity of glass micro-beads with different refractive indexes
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Table 1. Surface reflectivity of glass micro-beads with different refractive indexes
n R
1.93 0.101
2.00 0.111
2.20 0.141

Table 2. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)
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Table 2. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)
n Theoretical retro-reflectivity /%
0° 5° 30°
1.93 17.6 7.49 7.49
2.00 19.1 8.05 8.05
2.20 23.6 9.55 5.48

Table 3. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)
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Table 3. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)
n Theoretical retro-reflectivity /%
0° 5° 30° 45°
1.93 98.10 88.01 80.01 65.50
2.00 97.90 78.20 78.20 58.20
2.20 97.30 73.10 73.10 42.70

Table 4. Technical parameters of high-reflectivity substrate
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Table 4. Technical parameters of high-reflectivity substrate
Parameter Specification
Substrate Al
Wavelength /nm 808
Reflectance /% ≥99

Table 5. Parameters of evaporation process for AL, Ti₃O₅, and SiO₂
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Table 5. Parameters of evaporation process for AL, Ti₃O₅, and SiO₂
Material Substrate temperature /℃ Degree of vacuum /Pa Evaporation rate /(nm·s^-1) Flow rate of O₂ /(mL·min^-1)
Al Unbaked 1.0×10^-3 2.3 0
Ti₃O₅ 250 1.5×10^-2 0.3 22
SiO₂ 250 1.0×10^-2 0.7 20

Table 6. Actually measured retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)
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Table 6. Actually measured retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)
n Measured retro-reflectivity /%
0° 5° 30°
1.93 12.8 6.7 0
2.00 10.6 4.4 0
2.20 9.3 3.7 0

Table 7. Actual measured retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)
View table
Table 7. Actual measured retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)
n Measured retro-reflectivity /%
0° 5° 30° 45°
1.93 46.2 40.1 25.5 11.7
2.0 43.8 36.8 16.5 4.5
2.2 37.8 19.2 7.3 0

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Xiuhua Fu, Guojun Ma, Jingwen Lü, Dongmei Liu, Jing Zhang, Di Zhao. Open-Type Retro-Reflectors with High Reflectivity Using TracePro[J]. Acta Optica Sinica, 2019, 39(11): 1131003

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Paper Information

Category: Thin Films

Received: Jul. 1, 2019

Accepted: Jul. 24, 2019

Published Online: Nov. 6, 2019

The Author Email: Ma Guojun (maguojunfilm@126.com)

DOI:10.3788/AOS201939.1131003

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Surface reflectivity of glass micro-beads with different refractive indexes

Table 1. Surface reflectivity of glass micro-beads with different refractive indexes

Table 2. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)

Table 2. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)

Table 3. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)

Table 3. Theoretical retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)

Table 4. Technical parameters of high-reflectivity substrate

Table 4. Technical parameters of high-reflectivity substrate

Table 5. Parameters of evaporation process for AL, Ti3O5, and SiO2

Table 5. Parameters of evaporation process for AL, Ti3O5, and SiO2

Table 6. Actually measured retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)

Table 6. Actually measured retro-reflectivity of glass micro-beads with different refractive indices on ordinary substrate at different incident angles (wavelength is 808 nm)

Table 7. Actual measured retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)

Table 7. Actual measured retro-reflectivity of glass micro-beads with different refractive indices on high-reflectivity substrate at different incident angles (wavelength is 808 nm)

Table 5. Parameters of evaporation process for AL, Ti₃O₅, and SiO₂

Table 5. Parameters of evaporation process for AL, Ti₃O₅, and SiO₂