Chinese Optics Letters, Volume. 18, Issue 10, 103101(2020)

Optical characteristics of ultrathin amorphous Ge films

Meng Guo1,2,3, Hongbo He1,3、*, Kui Yi1,3, Shuying Shao1,3, Guohang Hu1,3, and Jianda Shao1,3,4
Author Affiliations
  • 1Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai 201800, China
  • 4Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
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    Figures & Tables(6)
    X-ray diffraction patterns of Ge films: (a) before annealing, (b) after annealing.
    Raman spectra of Ge films: (a), (b), (c) before annealing, (d) after annealing.
    Thickness at different deposition temperatures: (a) before annealing, (b) after annealing.
    Transmittance of Ge films on fused quartz: (a) before annealing, (b) after annealing.
    Optical band gap of Ge films on fused quartz: (a) before annealing, (b) after annealing.
    XPS analysis of Ge films after annealing: (a), (d) deposition (100°C) + annealing, (b), (e) deposition (200°C) + annealing, (c), (f) deposition (300°C) + annealing.
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    Meng Guo, Hongbo He, Kui Yi, Shuying Shao, Guohang Hu, Jianda Shao, "Optical characteristics of ultrathin amorphous Ge films," Chin. Opt. Lett. 18, 103101 (2020)

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    Paper Information

    Category: Thin Films and Optics at Surfaces

    Received: Mar. 28, 2020

    Accepted: Jun. 1, 2020

    Published Online: Aug. 3, 2020

    The Author Email: Hongbo He (hbhe@siom.ac.cn)

    DOI:10.3788/COL202018.103101

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