Design and Fabrication of a 248-nm Near-Linearly Graded Transmittance Optical Film

Zhu Rui; Tao Chunxian; Yu Zhen; Zhang Weili; Yi Kui

doi:10.3788/CJL202047.0603001

Chinese Journal of Lasers, Volume. 47, Issue 6, 603001(2020)

Design and Fabrication of a 248-nm Near-Linearly Graded Transmittance Optical Film

Zhu Rui^1,2, Tao Chunxian^1,3、*, Yu Zhen², Zhang Weili², and Yi Kui²

¹School of Optical-Electric and Computer Engineering, University of Shanghai for Science and Technology,Shanghai 200093, China

²Thin Film Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences,Shanghai 201800, China

³Engineering Research Center of Optical Instruments and Systems, Mimistry of Educaiton,University of Shanghai for Science and Technology, Shanghai 200093, China

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Figures & Tables(4)

Fig. 1. Transmittance spectrum of theoretical design of 248 nm graded transmittance thin film, and the transmittance spectra after the thickness deviation of every single layer at ±0.5% and ±1.0% based on the theoretical design

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Fig. 2. Angle-resolved transmittance spectra of the theoretical design film and manufactured films of sample 1 and sample 2

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Table 1. Characteristic of common coating materials for 248 nm wavelength

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Table 1. Characteristic of common coating materials for 248 nm wavelength

Optional material	Refractive index at 248 nm	Transparent area /μm	Melting point /℃	Boiling point /℃
MgF₂	1.40--1.45	0.11--10	1266	1540
AlF₃	1.38--1.42	0.11--20	890	900
SiO₂	1.45--1.55	0.18--9	1700	1600
LaF₃	1.60--1.65	0.13--12	1490	1490
HfO₂	2.05--2.20	0.24--12	2758	5400
Al₂O₃	1.70--1.80	0.18--8	2020	2100

Table 2. Comparison of design films A and B
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Table 2. Comparison of design films A and B
Type Passpercent /% Comprehensivesensitivity /% Normalizedelectric fieldintensity atfilm surface
Film A 90 5 0.56
Film B 93 3 0.25

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Zhu Rui, Tao Chunxian, Yu Zhen, Zhang Weili, Yi Kui. Design and Fabrication of a 248-nm Near-Linearly Graded Transmittance Optical Film[J]. Chinese Journal of Lasers, 2020, 47(6): 603001

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