Optical Technique, Volume. 50, Issue 1, 24(2024)

Study on damage threshold of antireflection film induced by artificial impurity

ZHANG Wangwei1, ZHU Huaxin1,2、*, HU Lifa1,2, LIU Tao1, CHEN Xiaojia1, and GUO Dongming1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(11)

    [1] [1] Norton M A, Donohue E E, Hollingsworth W G, et al. Growth of laser-initiated damage in fused silica at 351 nm[J]. Proceedings of SPIE-The International Society for Optical Engineering,2001,5273:468.

    [2] [2] Fan Zhengxiu, Shao Jianda, Yi Kui, et al. Optical thin films and applications[M]. Shanghai: Shanghai Jiao Tong University Press,2014.

    [3] [3] Xu C, Xiao QL, Ma JY, et al. High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films[J]. Applied Surface Science,2008,54(20):6554—6559.

    [4] [4] Royon A, Rivero-Baleine C, Zoubir A, et al. Evolution of the linear and nonlinear optical properties of femetosecond laser exposed fused silica[J]. Journal of The Optical Society of America B-Optical Physics,2009,26(11):2077.

    [5] [5] Hu Jiangchuan. Study on the ultraviolet high reflect films with high laser damage threshold[D]. Chongqing University,2005.

    [6] [6] Tang Jinfa, Gu Peifu, Liu Xu, et al. Modern optical thin films technology[M]. Hangzhou: Zhejiang University press,2006.

    [7] [7] Dai Gang. The measurement andnumeric analysis of millisecond laser induced damage of optical coatings componets[D]. Nanjing University of Science and Technology,2010.

    [8] [8] Cai Jixing, Zhang Ye, Wang Di, et al. Numerical simulation study on thermal stress damage in 1064nm anti-reflection fused silica by laser[J]. Journal of Changchun University of Science and Technology (Natural Science Edition),2014,37(06):77—81.

    [9] [9] Tetsuo Yoshioka, Taeko Ando, Mitsuhiro Shikida, et al. Tensile testing of SiO2 and Si3N4 films carried out on a silicon chip[J]. Sensors and Actuators,2000,82:291—296.

    [10] [10] Li Yan, Zhao Tingting, Wei Songbo, et al. Effect of Ta2O5/TiO2 thin film on mechanical properties, corrosion and cell behavior of the NiTi alloy implanted with tantalum[J]. Materials Science and Engineering,2010,30(8):1227—1235.

    [11] [11] Mark Mero, Jianhua Liu, Ali Sabbah, et al. Femtosecond pulse damage and predamage behavior of dielectric thin films[D]. San Diego, USA: SPIE Laser Damage,2003,4932:201—215.

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    ZHANG Wangwei, ZHU Huaxin, HU Lifa, LIU Tao, CHEN Xiaojia, GUO Dongming. Study on damage threshold of antireflection film induced by artificial impurity[J]. Optical Technique, 2024, 50(1): 24

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    Paper Information

    Received: Jun. 16, 2023

    Accepted: --

    Published Online: Jun. 28, 2024

    The Author Email: Huaxin ZHU (zhuhuaxin1312@163.com)

    DOI:

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