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Chinese Journal of Lasers, Volume. 45, Issue 11, 1103001(2018)

Fabrication of High-Reflective Cavity Mirrors for 457 nm Laser Based on Intracavity Frequency Doubling

Dongmei Liu*, Wuyi Li*, Xiuhua Fu, Jing Zhang, and Gong Zhang
Author Affiliations
  • School of Electro-Optical Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (11)
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    Cited By (3)
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    Figures & Tables(11)
    Reflectivity curve from theoretically designed spectrum

    Fig. 1. Reflectivity curve from theoretically designed spectrum

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    Transmissivity curve from back surface designed spectrum

    Fig. 2. Transmissivity curve from back surface designed spectrum

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    Comparison between theoretically designed curve and test one of reflectivity

    Fig. 3. Comparison between theoretically designed curve and test one of reflectivity

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    Residual evaporation amount at each layer

    Fig. 4. Residual evaporation amount at each layer

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    Residual evaporation amount of H4 versus film thickness

    Fig. 5. Residual evaporation amount of H4 versus film thickness

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    Residual evaporation amount of SiO2 versus film thickness

    Fig. 6. Residual evaporation amount of SiO2 versus film thickness

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    Comparison between theoretically designed curve and test one after technique improvement

    Fig. 7. Comparison between theoretically designed curve and test one after technique improvement

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    Comparison between theoretically designed curve and test one for both-side spectrum

    Fig. 8. Comparison between theoretically designed curve and test one for both-side spectrum

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    Laser damage probability

    Fig. 9. Laser damage probability

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    • Table 1. Specifications of high-reflective film on laser cavity surface

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      Table 1. Specifications of high-reflective film on laser cavity surface

      Wavelength /nmReflectivity /%
      457≥99
      808≤4
      914≥99
      1064≤4
      1342≤8

    • Table 2. Evaporation process parameters of H4 and SiO2

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      Table 2. Evaporation process parameters of H4 and SiO2

      MaterialSubstratetemperature /℃Degree ofvacuum /PaEvaporationrate /(nm·s-1)Flow rateof O2 /(mL·min-1)
      H42901.0×10-20.318
      SiO22901.0×10-20.722
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    Dongmei Liu, Wuyi Li, Xiuhua Fu, Jing Zhang, Gong Zhang. Fabrication of High-Reflective Cavity Mirrors for 457 nm Laser Based on Intracavity Frequency Doubling[J]. Chinese Journal of Lasers, 2018, 45(11): 1103001

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    Paper Information

    Category: materials and thin films

    Received: May. 28, 2018

    Accepted: Jul. 17, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201845.1103001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology