Journal of Radiation Research and Radiation Processing, Volume. 40, Issue 5, 050701(2022)

Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor

Fei CHU1,2、*, Hongzhuan CHEN1, Ling PENG2, Ying WANG2, and Jingyi NING2
Author Affiliations
  • 1Nanjing University of Aeronautics and Astronautics, Nanjing 211106, China
  • 2Beijing Microelectronics Technology Institute, Beijing 100076, China
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    References(14)

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    [7] LI Yanfei, WU Jianwei, GU Xiang et al. Structure optimization for SEB tolerant enhancement in 30 V NLDMOS[J]. Electronics and Packaging, 18, 36-39(2018).

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    [10] Jia Y P, Peng L, Su H Y et al. Effect of grade doping buffer layer on SEE failure in VDMOSFET[C], 276-279(2016).

    [11] Dodd P E, Shaneyfelt M R, Draper B L et al. Development of a radiation-hardened lateral power MOSFET for POL applications[J]. IEEE Transactions on Nuclear Science, 56, 3456-3462(2009).

    [12] Hamlyn M, Hower P L, Warren K et al. Transmission line pulse test method for estimating SEB performance of n-channel lateral DMOS power transistors[J]. IEEE Transactions on Nuclear Science, 65, 249-255(2018).

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    Fei CHU, Hongzhuan CHEN, Ling PENG, Ying WANG, Jingyi NING. Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor[J]. Journal of Radiation Research and Radiation Processing, 2022, 40(5): 050701

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    Paper Information

    Category: Research Articles

    Received: Mar. 23, 2022

    Accepted: May. 6, 2022

    Published Online: Nov. 3, 2022

    The Author Email: Fei CHU (sdcf_2000@163.com)

    DOI:10.11889/j.1000-3436.2022-0035

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