Laser & Optoelectronics Progress, Volume. 55, Issue 8, 81403(2018)

Design and Fabrication of High Power 640 nm Red Laser Diodes

Zhu Zhen1, Xiao Chengfeng1, Xia Wei1,2, Zhang Xin1, Su Jian1, Li Peixu1, and Xu Xiangang1,3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(18)

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    [2] [2] Sumitomo H, Kajiyama S, Oguri H, et al. Uniform and high-power characteristics of AlGaInP-based laser diodes with 4-inch-wafer process technology[J]. IEEE Journal of Selected Topics in Quantum Electronics, 2007, 13(5): 1170-1175.

    [3] [3] Sumpf B, Fricke J, Ressel P, et al. 20000 h reliable operation of 100 μm stripe width 650 nm broad area lasers at more than 1.1 W output power[J]. Semiconductor Science and Technology, 2011, 26(10): 105011.

    [4] [4] Sumpf B, Zorn M, Staske R, et al. High-efficient 650 nm laser bars with an output power of about 10 W and a wall-plug efficiency of 30%[J]. Proceedings of SPIE, 2006, 6133: 61330D.

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    [14] [14] Xu Y. Fabrication of 650 nm high-power single-mode AlGaInP semiconductor laser diodes and its reliability analysis[D]. Beijing: Institute of Semiconductors, Chinese Academy of Sciences, 2005: 32-40.

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    Zhu Zhen, Xiao Chengfeng, Xia Wei, Zhang Xin, Su Jian, Li Peixu, Xu Xiangang. Design and Fabrication of High Power 640 nm Red Laser Diodes[J]. Laser & Optoelectronics Progress, 2018, 55(8): 81403

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Feb. 18, 2018

    Accepted: --

    Published Online: Aug. 13, 2018

    The Author Email:

    DOI:10.3788/lop55.081403

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