Acta Optica Sinica, Volume. 35, Issue 12, 1211001(2015)
Extreme Ultraviolet Lithography Objective Design Based on Grouping and Graphical User Interface
Article index updated: Mar. 10, 2025
Get Citation
Copy Citation Text
Wang Jun, Wang Liping, Jin Chunshui, Miao Liang, Xie Yao. Extreme Ultraviolet Lithography Objective Design Based on Grouping and Graphical User Interface[J]. Acta Optica Sinica, 2015, 35(12): 1211001
Category: Imaging Systems
Received: Jul. 1, 2015
Accepted: --
Published Online: Dec. 10, 2015
The Author Email: Jun Wang (Wangjun_2100@163.com)