High-power Pr<sup>3+</sup>:YLF continuous wave lasers at 691.7 nm, 701.4 nm, 705.0 nm, and 708.7 nm

Run Fang; Rongbin Dai; Huiying Xu; Zhiping Cai

doi:10.3788/COL202422.081404

Chinese Optics Letters, Volume. 22, Issue 8, 081404(2024)

High-power Pr³⁺:YLF continuous wave lasers at 691.7 nm, 701.4 nm, 705.0 nm, and 708.7 nm

Run Fang^1,2,3, Rongbin Dai^1,3, Huiying Xu^1,3, and Zhiping Cai^1,3、*

Author Affiliations

¹Department of Electronic Engineering, Xiamen University, Xiamen 361005, China

²School of Physics and Electronic Science, Guizhou Normal University, Guiyang 550001, China

³Fujian Key Laboratory of Ultrafast Laser Technology and Applications, Xiamen University, Xiamen 361005, China

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Run Fang, Rongbin Dai, Huiying Xu, Zhiping Cai, "High-power Pr³⁺:YLF continuous wave lasers at 691.7 nm, 701.4 nm, 705.0 nm, and 708.7 nm," Chin. Opt. Lett. 22, 081404 (2024)

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Paper Information

Category: Lasers, Optical Amplifiers, and Laser Optics

Received: Jan. 31, 2024

Accepted: Apr. 18, 2024

Published Online: Aug. 22, 2024

The Author Email: Zhiping Cai (zpcai@xmu.edu.cn)

DOI:10.3788/COL202422.081404

CSTR:32184.14.COL202422.081404

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology