Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition

Lin Lai; Yanghui Li; Hui Zhou; Haosheng Xia; Xiaoyu Liu; Chengliang Xia; Le Wang

doi:10.3788/LOP55.033101

Laser & Optoelectronics Progress, Volume. 55, Issue 3, 033101(2018)

Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition

Lin Lai, Yanghui Li^*, Hui Zhou, Haosheng Xia, Xiaoyu Liu, Chengliang Xia, and Le Wang

Author Affiliations

College of Optical and Electronic Technology, China Jiliang University, Hangzhou, Zhejiang 310018, China

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Lin Lai, Yanghui Li, Hui Zhou, Haosheng Xia, Xiaoyu Liu, Chengliang Xia, Le Wang. Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition[J]. Laser & Optoelectronics Progress, 2018, 55(3): 033101

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Paper Information

Category: Thin films

Received: Sep. 12, 2017

Accepted: --

Published Online: Sep. 10, 2018

The Author Email: Yanghui Li (lyh@cjlu.edu.cn)

DOI:10.3788/LOP55.033101

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology