[1] [1] C. Amra,C. Grezes-Besset,L. Bruel. Comparison of surface and bulk scattering in optical multilayers [J]. Appl. Opt.,1993,32(28):5492-5503

[2] [2] Wang Yinglong,Zhang Rongmei,Fu Guangsheng et al.. Influence of inert gas pressure on the surface roughness of silicon film prepared by pulsed laser deposition [J]. Chinese J. Lasers,2004,31(6):698-700

[3] [3] Hou Haihong,Fan Zhengxiu,Shao Jianda et al.. Scalar scattering theory of optical surfaces [J]. Laser & Optoelectronics Progress,2005,42(11):35-38

[4] [4] Hou Haihong,Sun Xilian,Shen Yanming et al.. Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation [J]. Acta Physica Sinica,2006,55(6):3124-3127

[5] [5] Qiu Dongjiang,Shi Chengru,Wu Huizhen. Highly transparent nanocrystalline diamond films on quartz substrates [J]. Acta Physica Sinica,2002,51(8):1870-1874

[6] [6] Pan Yongqiang,Wu Zhensen,Hang Lingxia et al.. Study on the interface roughness of multilayer dielectric optical thin film [J]. Infrared and Laser Engineering,2009,38(3):433-436

[7] [7] Wang Yingjian,Li Qingguo,Fan Zhengxiu. Property comparison of optical thin films prepared by E-beam,ion assisted deposition and ion beam sputtering [J]. High Power Laser and Particle Beams,2003,15(9):841-844

[8] [8] Tian Guanglei,Shen Yanming,Shen Jian et al.. Influence of technological conditions of deposition process on microstructure of thin films [J]. Chinese J. Lasers,2006,33(5):673-678

[9] [9] Guo Peitao,Xue Yiyu,Zhang Guangyong et al.. Surface morphology and optical property of Ta2O5 thin film [J]. Vacuum,2007,44(5):32-35

[10] [10] Hou Haihong,Hong Ruijin,Fan Zhengxiu et al.. Measurement of surface and volume scattering of glass substrates with high finish [J]. High Power Laser and Particle Beams,2006,18(4):609-611

[11] [11] K. Meinel,K. M. Schindler,H. Neddermeyer. Scanning tunneling microscopy study on the preparation and characterization of zirconium oxide islands on Ag(100) [J]. Surface Science,2002,515(1):226-234

[12] [12] M. C. Salvadori,D. R. Martins,M. Cattani. DLC coating roughness as a function of film thickness [J]. Surface & Coatings Technology,2006,200:5119-5122

[13] [13] Pan Yongqiang,Wu Zhensen,Hang Lingxia et al.. Study on surface roughness of ZrO2 thin films [J]. J. Applied Optics,2008,29(4):606-609

[14] [14] Pan Yongqiang,Wu Zhensen,Hang Lingxia. Optical thin films interfaces roughness cross-correlated properties and light scattering [J]. Chinese J. Lasers,2008,35(6):916-920

[15] [15] Wang Congjuan,Jin Yunxia,Shao Jianda et al.. Influence of three post-treatment methods on properties of ZrO2 thin films [J]. Chinese J. Lasers,2008,35(10):1600-1604

[16] [16] Pan Yongqiang,Zhu Chang,Chen Zhili et al.. Study of properties of new end hall ion source and its ion beam characteristics [J]. Vacuum Science and Technology,2003,23(1):57-60