Acta Optica Sinica, Volume. 21, Issue 9, 1065(2001)

Ultimate Curves of Aberration and Strehl Ratio

[in Chinese]1,2, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(2)

    [1] [1] van den Bos A. Aberration and the Strehl ratio. J. Opt. Soc. Am. (A),2000, 17(2):356~358

    [2] [2] van den Bos A. Rayleigh wave-front criterion: Comment. J. Opt. Soc. Am. (A), 1999,16(9):2307~2309

    CLP Journals

    [1] Hu Shijie, Xu Bing, Chen Shanqiu, Yang Ping, Wu Jian. Aberration Decoupling Analysis in Adaptive Optics System with Two Sets of Wavefront Correctors for All-path Aberration Correction[J]. Acta Optica Sinica, 2009, 29(7): 1761

    [2] ZHANG Hao, FANG Wei, YE Xin, JIANG Ming, SONG Bao-qi. Dual-order overlapped Offner imaging spectrometer in middle- and long- wave infrared regions[J]. Optics and Precision Engineering, 2015, 23(4): 965

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    [in Chinese], [in Chinese], [in Chinese]. Ultimate Curves of Aberration and Strehl Ratio[J]. Acta Optica Sinica, 2001, 21(9): 1065

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 30, 2000

    Accepted: --

    Published Online: Aug. 10, 2006

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