Researching | Focal depth extending using rotational symmetric pupil masks

Chinese Optics Letters, Volume. 5, Issue 2, 71(2007)

Focal depth extending using rotational symmetric pupil masks

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

State Key Laboratory of Modern Optical Instrumentation, Optical Engineering Department, Zhejiang University, Hangzhou 310027

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References(9)

[1] [1] E. R. Dowski, Jr., W. T. Cathey, and S. C. Bradburn, Opt. Rev. 3, 429 (1996).

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[3] [3] Y. Li, Acta Opt. Sin. (in Chinese) 24, 865 (2004).

[4] [4] J. Pan, Acta Opt. Sin. (in Chinese) 23, 1475 (2003).

[5] [5] E. R. Dowski, Jr. and W. T. Cathey, Appl. Opt. 34, 1859 (1995).

[6] [6] W. Zhang, Y. Chen, T. Zhao, Z. Ye, and F. Yu, Chin. Opt. Lett. 4, 515 (2006).

[7] [7] X. Liu, X. Cai, and C. P. Grover, Proc. SPIE 5174, 51 (2003).

[8] [8] J. Ojeda-Castaneda, J. C. Escalera, and M. J. Yzuel, Opt. Commun. 114, 189 (1995).

[9] [9] D. Zalvidea and E. E. Sicre, Appl. Opt. 37, 3623 (1998).

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], "Focal depth extending using rotational symmetric pupil masks," Chin. Opt. Lett. 5, 71 (2007)

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Paper Information

Received: May. 15, 2006

Accepted: --

Published Online: Feb. 8, 2007

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Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology