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Chinese Journal of Lasers, Volume. 48, Issue 17, 1700001(2021)

Hefei Infrared Free-Electron Laser Facility

Heting Li1, Zhigang He1, Fangfang Wu1, Leilei Tang1, Zhouyu Zhao1, Tong Zhang1, Tianlong He1, Ke Xuan1, Haiyan Zhang1, Wei Wei1, Ping Lu1, Zeran Zhou1, Lei Shang1, Gongfa Liu1, Hongliang Xu1, Xiaoye He1, Shiping Jiang1, Xiangtao Pei1, Chen Gao1,2, Qika Jia1, Jun Bao1, Shancai Zhang1、*, and Lin Wang1、**
Author Affiliations
  • 1National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, Anhui 230029, China
  • 2School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 101408, China
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    AbstractGet PDF(in Chinese)
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    References (22)
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    Figures & Tables(8)
    Layout of FELiChEM

    Fig. 1. Layout of FELiChEM

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    Photo of core device of FELiChEM

    Fig. 2. Photo of core device of FELiChEM

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    Layout of beamline and research stations of FELiChEM

    Fig. 3. Layout of beamline and research stations of FELiChEM

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    Macropulse energy of mid-infrared laser of FELiChEM versus wavelength when macrobunch width of electron beam is 10 μs, repetition rate of microbunch is 119 MHz, and diameter of out-coupling hole is 2.5 mm

    Fig. 4. Macropulse energy of mid-infrared laser of FELiChEM versus wavelength when macrobunch width of electron beam is 10 μs, repetition rate of microbunch is 119 MHz, and diameter of out-coupling hole is 2.5 mm

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    Typical spectra of mid-infrared laser of FELiChEM measured by grating spectrometer under different center wavelengths. (a) 2.34 μm; (b) 10.6 μm; (c) 25 μm; (d) 35 μm

    Fig. 5. Typical spectra of mid-infrared laser of FELiChEM measured by grating spectrometer under different center wavelengths. (a) 2.34 μm; (b) 10.6 μm; (c) 25 μm; (d) 35 μm

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    • Table 1. Main parameters of FELiChEM linac

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      Table 1. Main parameters of FELiChEM linac

      ParameterDesigned valueAchieved value
      Electron beam energy /MeVMax: 6065
      Energy spread (root mean square) /MeV<0.24<0.24
      Normalized emittance /(mm·mrad)<3020--50
      Peak current /A100>100 (calculated)
      Charge /nC1.01.0--1.5
      Macrobunch repetition rate /HzMax: 101--10
      Macrobunch width /μsMax: 10Max: 10
      Microbunch repetition rate /MHz238/119/59.5/29.75238/119/59.5/29.75
      Microbunch width (root mean square) /ps4.5<5 (calculated)

    • Table 2. Main parameters of FELiChEM oscillators

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      Table 2. Main parameters of FELiChEM oscillators

      Component of oscillatorParameterMid-infrared bandFar-infrared band
      UndulatorTypePeriod /mmPeriod numberMaximum undulator deflection parameterPlanar, permanent46503.2Planar, permanent56403.3
      Cavity length /m5.045.04
      Optical cavityReflectivity of mirrors /%Diameter of mirrors /mmCurvature radius of mirrors /mDiameter of coupling holes /mm98.5502.7561.0/1.5/2.5/3.598.5803.0181.0/2.0/4.0

    • Table 3. Main performances of mid-infrared laser

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      Table 3. Main performances of mid-infrared laser

      ParameterAchieved value
      Wavelength range /μm2--50
      Continuous tunability /%~300
      Macropulse energy /mJMax:182
      Macropulse width /μs1--10
      Macrobunch repetition rate /Hz1--10
      Micropulse energy /μJMax: 170
      Micropulse width (RMS) /ps--
      Micropulse repetition rate /MHz119/59.5/29.75
      Bandwidth (FWHM) /%0.2--2
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    Heting Li, Zhigang He, Fangfang Wu, Leilei Tang, Zhouyu Zhao, Tong Zhang, Tianlong He, Ke Xuan, Haiyan Zhang, Wei Wei, Ping Lu, Zeran Zhou, Lei Shang, Gongfa Liu, Hongliang Xu, Xiaoye He, Shiping Jiang, Xiangtao Pei, Chen Gao, Qika Jia, Jun Bao, Shancai Zhang, Lin Wang. Hefei Infrared Free-Electron Laser Facility[J]. Chinese Journal of Lasers, 2021, 48(17): 1700001

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    Paper Information

    Category: reviews

    Received: Feb. 8, 2021

    Accepted: Mar. 9, 2021

    Published Online: Sep. 1, 2021

    The Author Email: Zhang Shancai (shancai@ustc.edu.cn), Wang Lin (wanglin@ustc.edu.cn)

    DOI:10.3788/CJL202148.1700001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology