Acta Optica Sinica, Volume. 34, Issue 9, 905002(2014)
Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography
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Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2014, 34(9): 905002
Paper Information
Category: Diffraction and Gratings
Received: Mar. 25, 2014
Accepted: --
Published Online: Aug. 15, 2014
The Author Email: Xiaolei Liu (liuxl@siom.ac.cn)
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