Number Simulation for Laser Occultation Measurement of Atmospheric Vapor Mixing Ratio

Hong Guanglie; Li Hu; Wang Yinan; Li Jiatang; Chen Shaojie

doi:10.3788/AOS202040.0401001

Acta Optica Sinica, Volume. 40, Issue 4, 401001(2020)

Number Simulation for Laser Occultation Measurement of Atmospheric Vapor Mixing Ratio

Hong Guanglie^1、*, Li Hu^1,2, Wang Yinan³, Li Jiatang^1,2, and Chen Shaojie^1,2

¹Key Laboratory of Active Opto-Electronics Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

²University of Chinese Academy of Sciences, Beijing 100049, China

³Key Laboratory of Middle Atmosphere and Global Environment Observation, Beijing 100029, China

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Hong Guanglie, Li Hu, Wang Yinan, Li Jiatang, Chen Shaojie. Number Simulation for Laser Occultation Measurement of Atmospheric Vapor Mixing Ratio[J]. Acta Optica Sinica, 2020, 40(4): 401001

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Paper Information

Category: Atmospheric Optics and Oceanic Optics

Received: Sep. 17, 2019

Accepted: --

Published Online: Feb. 11, 2020

The Author Email: Guanglie Hong (glhong@mail.sitp.ac.cn)

DOI:10.3788/AOS202040.0401001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology