Research on the Tapered Sidewall Etching of Quartz Based on Photoresist Modification Technology

LIU Dan; WU Liying; SHEN Yunliang; ZHANG Wenhao; LIU Min; QUAN Xueling; CHENG Xiulan

doi:10.16818/j.issn1001-5868.2024021901

Semiconductor Optoelectronics, Volume. 44, Issue 4, 606(2024)

Research on the Tapered Sidewall Etching of Quartz Based on Photoresist Modification Technology

LIU Dan, WU Liying, SHEN Yunliang, ZHANG Wenhao, LIU Min, QUAN Xueling, and CHENG Xiulan

Center for Advanced Electronic Materials and Devices, School of Electronic Information and Electrical Engineering, Shanghai Jiaotong University, Shanghai 200240, CHN

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LIU Dan, WU Liying, SHEN Yunliang, ZHANG Wenhao, LIU Min, QUAN Xueling, CHENG Xiulan. Research on the Tapered Sidewall Etching of Quartz Based on Photoresist Modification Technology[J]. Semiconductor Optoelectronics, 2024, 44(4): 606

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Paper Information

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Received: Feb. 19, 2024

Accepted: Feb. 13, 2025

Published Online: Feb. 13, 2025

The Author Email:

DOI:10.16818/j.issn1001-5868.2024021901

Topics

laser devices and laser physics

Lasers and Laser Optics

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laser manufacturing

Instrumentation, Measurement and Metrology