Chinese Journal of Lasers, Volume. 15, Issue 4, 201(1988)

Saturable reactor used as charging inductor in copper vapor lasers

Huang Zhenguo, Shan Huanyan, Chen Ti, Huo yuan, Wang Hong, and Yu Zuehe
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    References(5)

    [1] [1] Grove Rober Ε. Laser Focus, 1982: 18(7): 45

    [2] [2] Karny Ζ et al. Rev. Sci. Instrum., 1980; 51(10): 1426

    [3] [3] Nam Κ Η, Seguin Η J J. IEEE J. Quant. Electr., 1979; QE-15(1): 44

    [4] [4] Black Susan, Burkes Τ Ε. Proc. 2nd TEEE Int. Pulsed Power Conference, Lubbocr, TX 1979, (IEEE New York), 1979; 102

    [5] [5] Peter В A et al. 4th Int. Conf. on Pulsed Power Technology, Albuauerque NM 1983 (Texas Tech. Press, New Mexico), 1983: 236

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    Huang Zhenguo, Shan Huanyan, Chen Ti, Huo yuan, Wang Hong, Yu Zuehe. Saturable reactor used as charging inductor in copper vapor lasers[J]. Chinese Journal of Lasers, 1988, 15(4): 201

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    Paper Information

    Category: Laser physics

    Received: Nov. 7, 1986

    Accepted: --

    Published Online: Aug. 13, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

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