Optical design of hybrid surface EUV lithography objective

YU Sichen; NAN Yanbei; CHEN Yuqing; YAN Xu; LIU Lihui; LI Yanqiu

Optical Technique, Volume. 51, Issue 4, 408(2025)

YU Sichen, NAN Yanbei, CHEN Yuqing, YAN Xu, LIU Lihui^*, and LI Yanqiu

Key Laboratory of Photoelectric Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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YU Sichen, NAN Yanbei, CHEN Yuqing, YAN Xu, LIU Lihui, LI Yanqiu. Optical design of hybrid surface EUV lithography objective[J]. Optical Technique, 2025, 51(4): 408

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Paper Information

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Received: Feb. 20, 2025

Accepted: Aug. 12, 2025

Published Online: Aug. 12, 2025

The Author Email: LIU Lihui (liulihui@bit.edu.cn)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology