The extreme ultraviolet lithography objective with a numerical aperture of 0.33 is composed of 6 high-order aspheric mirrors. However, the objective system containing large-aperture aspheric mirrors has more stringent requirements on processing and detection accuracy. A design method for hybrid surface optimization is proposed. Small-aperture aspheric mirrors are replaced with free-form surfaces one by one using the interactive iterative optimization technology of free-form surfaces and aspheric mirrors. The high-order coefficients of large-aperture mirrors are effectively reduced, and the aspheric coefficient of the largest-aperture mirror is reduced from 16th order to 10th order. The difficulty of objective processing and detection is significantly reduced. A set of NA 0.33 hybrid surface extreme ultraviolet lithography objective system was designed using this method. The distortion value of the objective system is less than 0.294nm, and the root mean square value of the wavefront error is less than 0.0143λ （λ=13.5nm）. By selecting the compensator by the inverse sensitivity method, the tolerance of the objective system is improved by one order of magnitude. At a cumulative probability of 97.7%, the wavefront error RMS is less than 0.037λ, and the stability of the lithography objective system is further improved.