0.532-\mum laser conditioning of HfO2/SiO2 third harmonic separator fabricated by electron-beam evaporation

Dawei Li; Yuan'an Zhao; Jianda Shao; Zhengxiu Fan; Hongbo He

Chinese Optics Letters, Volume. 6, Issue 5, 386(2008)

Dawei Li^*, Yuan'an Zhao, Jianda Shao, Zhengxiu Fan, and Hongbo He

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 2018002 Graduate University of Chinese Academy of Sciences, Beijing 100049

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CLP Journals

[1] Xiao Li, Yuan'an Zhao, Xiaofeng Liu, Jianda Shao, Zhengxiu Fan, "Influence of laser conditioning on defects of HfO2 monolayer films," Chin. Opt. Lett. 8, 615 (2010)

[2] Xiao Li, Xiaofeng Liu, Yuan'an Zhao, Jianda Shao, Zhengxiu Fan, "Laser-conditioning mechanism of ZrO2/SiO2 HR films with fitting damage probability curves of laser-induced damage," Chin. Opt. Lett. 8, 598 (2010)

[3] Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao, "The mulDamage characteristics of HfO₂/SiO₂ high reflector at 45° incidence in 1-on-1 and N-on-1 tests," Chin. Opt. Lett. 8, 41 (2010)

[4] Xiaofeng Liu, Dawei Li, Yuan’an Zhao, Xiao Li, Xiulan Ling, Jianda Shao, "Automated damage diagnostic system for laser damage threshold tests," Chin. Opt. Lett. 8, 407 (2010)

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Dawei Li, Yuan'an Zhao, Jianda Shao, Zhengxiu Fan, Hongbo He, "0.532-\mum laser conditioning of HfO2/SiO2 third harmonic separator fabricated by electron-beam evaporation," Chin. Opt. Lett. 6, 386 (2008)

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Paper Information

Received: Oct. 9, 2007

Accepted: --

Published Online: May. 20, 2008

The Author Email: Dawei Li (dawei_510@yahoo.com.cn)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology