Infrared and Laser Engineering, Volume. 52, Issue 6, 20230269(2023)

Research progress of laser dazzle and damage CMOS image sensor (invited)

Jiaqi Wen1,2, Jintian Bian1,2, Xin Li1,2, Hui Kong1,2, Lei Guo3, and Guorui Lv1,2
Author Affiliations
  • 1State Key Laboratory of Pulsed Power Laser Technology, Electronic Countermeasure Institute, National University of Defense Technology, Hefei 230037, China
  • 2Anhui Laboratory of Advanced Laser Technology, Electronic Countermeasure Institute, National University of Defense Technology, Hefei 230037, China
  • 3School of Mechanics and Optoelectronic Physics, Anhui University of Science and Technology, Huainan 232001, China
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    Figures & Tables(12)
    Effect of pulsed laser parameters on damage
    (a) Pixel structures of passive pixel CMOS and (b) active pixel CMOS[13]
    DTI between CMOS pixels[15]
    Schematic of the structure of the Front Side Illuminated CMOS image sensor[5]
    Comparison of pixel structures between the FSI-CMOS and BSI-CMOS. (a) Front lighting structure; (b) Back lighting structure
    Correlated double sampling working process of CMOS pixels[16]
    Curve of interference area with incident laser energy density[4]
    Comparison of irreversible damage to CMOS and CCD by nanosecond laser[24]
    Comparison of morphology of CMOS surface damage induced by different lasers[24]. (a) Morphology of picosecond laser damage; (b) Morphology of femtosecond laser damage
    Comparison of damage to CCD, FSI-CMOS and BSI-CMOS[11]
    • Table 1. Comparison of laser interference thresholds for CMOS image sensors

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      Table 1. Comparison of laser interference thresholds for CMOS image sensors

      Laser sourceCMOS modelSaturationOver saturationCrosstalkFull screen saturation
      1.06 mm, 64 kHz, 10 nsSONY IMX035LQZ-C35.8 W/cm2--4.3×103 W/cm2
      1.06 mm, 10 Hz, 5 nsDH HV1300FM7.70×10−2 J/cm2---
      1.06 mm, 10 Hz, 5 ns (vacuum)DH HV1300FM7.70×10- 2 J/cm2---
      532 nm CWMicron MT9V0224.32×10−4 W/cm28.7×102 W/cm2--
      1064 nm CWMicron MT9V0225.87×10−3 W/cm26.0×102 W/cm22.0×103 W/cm22.0×103 W/cm2
      632 nm CWDH HV-U 1×10−1 mW ---
      632 nm CWMicron MT9V0324.2×10−5 W/cm24.1 W/cm2-11.6-24.3 W/cm2
      1031 nm, 226.5 ps, 9.6 MHzMicron MT9V034 -2.3 mW630 mW-
      1031 nm, 226.5 ps, 2.4 MHzMicron MT9V034 -1.3 mW28.5 mW-
      1064 nm, 5 Hz, 10 nsMicron MT9V032 ---0.76 mJ/cm
    • Table 2. Comparison of laser damage thresholds for CMOS image sensors

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      Table 2. Comparison of laser damage thresholds for CMOS image sensors

      Laser sourceCMOS modelTest methodPoint damageBlack line damageCross damage
      1064 nm, 10 Hz, 5 nsDH HV1300FM1-on-10.5 J/cm2-626 J/cm2
      1064 nm, 10 Hz, 5 ns (vacuum)DH HV1300FM1-on-10.5 J/cm2-273 J/cm2
      1064 nm, 60 nsMicron MT9V022l-on-10.38 J/cm20.64 J/cm21.0 J/cm2
      1064 nm, 25 psMicron MT9V022l-on-119.1 mJ/cm267.8 mJ/cm2130.1 mJ/cm2
      800 nm, 100 fsMicron MT9V022l-on-14.1 mJ/cm2--
      1.06 mm, 10 ns double-pulses, interval 80 ns Micron MT9V0221-on-10.29 J/cm2(double) --
      1-on-10.67 J/cm2 (single)
      1031 nm, 226.5 ps, 9.6 MHzMicron MT9 V034S-on-1-1.06 W2.5 W
      1031 nm, 226.5 ps, 2.4 MHzMicron MT9V034S-on-1-720 mW800 mW
      532 nm, CWDCC1645CS-on-1150 kW/cm21400 kW/cm2>4000 kW/cm2 (destroyed)
      532 nm, CWDCC1545MS-on-1800 kW/cm21100 kW/cm2>4000 kW/cm2 (destroyed)
      532 nm, 10 nsMT9V024l-on-10.035 J/cm238.6 J/cm2-
      526.5 nm, 8.2 psMT9V024l-on-10.01 J/cm218 J/cm2-
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    Jiaqi Wen, Jintian Bian, Xin Li, Hui Kong, Lei Guo, Guorui Lv. Research progress of laser dazzle and damage CMOS image sensor (invited)[J]. Infrared and Laser Engineering, 2023, 52(6): 20230269

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    Paper Information

    Category: Image processing

    Received: May. 6, 2023

    Accepted: --

    Published Online: Jul. 26, 2023

    The Author Email:

    DOI:10.3788/IRLA20230269

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