We design and fabricate a hard X-ray Fresnel zone plate with high diffraction efficiency for the imaging application of synchrotron radiation. By evaluating the influencing factors of the diffraction efficiency of zone plate, the relevant parameters of the zone plate are determined, and the zone plate on a hollowed-out silicon nitride substrate is fabricated by electron beam lithography and electroplating methods. The width of the outmost zone is 65 nm, the thickness of the zone plate is 1.64 μm, and the aspect ratio of the outmost ring is 25. The side wall of the zone is smooth and straight. This zone plate can be used for hard X-ray imaging in the 5?10 keV range.