Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Lufeng Liao; Sikun Li; Xiangzhao Wang; Libin Zhang; Shuang Zhang; Pengzheng Gao; Yayi Wei; Weijie Shi

doi:10.3788/AOS202040.2122001

Acta Optica Sinica, Volume. 40, Issue 21, 2122001(2020)

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Lufeng Liao^1,2, Sikun Li^1,2、*, Xiangzhao Wang^1,2、**, Libin Zhang^2,3, Shuang Zhang^2,3, Pengzheng Gao^2,3, Yayi Wei^2,3, and Weijie Shi⁴

Author Affiliations

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;

⁴Dongfang Jingyuan Electron Limited, Beijing 100176, China

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Lufeng Liao, Sikun Li, Xiangzhao Wang, Libin Zhang, Shuang Zhang, Pengzheng Gao, Yayi Wei, Weijie Shi. Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization[J]. Acta Optica Sinica, 2020, 40(21): 2122001

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Paper Information

Category: Optical Design and Fabrication

Received: Jun. 15, 2020

Accepted: Jul. 15, 2020

Published Online: Oct. 17, 2020

The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/AOS202040.2122001

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