Acta Physica Sinica, Volume. 69, Issue 9, 098502-1(2020)

Single-event-upset effect simulation of HfO2-based ferroelectric field effect transistor read and write circuits

Hua-Mei Li1, Peng-Fei Hou1,2、*, Jin-Bin Wang1, Hong-Jia Song1, and Xiang-Li Zhong1、*
Author Affiliations
  • 1Department of Material Science and Engineer, Xiangtan University, Xiangtan 411105, China
  • 2Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory, Fifth Institute of Electronics of the Ministry of Industry and Information Technology, Guangzhou 510610, China
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    Figures & Tables(14)
    Device physical models of HfO2-based FeFET.
    Read and write circuit of 2 × 2 ferroelectric memory array.
    Control simulation timing of 2 × 2 ferroelectric memory array.
    Charge density distribution inside the device when HfO2-based FeFET is written: (a) The internal charge distribution of the device is written with “1”; (b) the internal charge distribution of the device is written with “0”.
    Reading and writing of ferroelectric memory arrays: (a) Changes in the output signal of the sense amplifier; (b) changes in the output signal of cell 1; (c) changes in the polarization of cell 1.
    Transient effects of single-particle incident read and write “0” ferroelectric storage tube drain: (a) Change of drain current pulse; (b) change of cell 1 output signal; (c) change of cell 1 polarization intensity; (d) change of sense amplifier output signal.
    Transient effects of single-particle incident read and write “1” ferroelectric storage tube drain: (a) Change of cell 1 polarization intensity; (b) change of cell 1 output signal; (c) change of sense amplifier output signal.
    Transient effects of a single-particle incident sensible amplifier input tube when reading and writing “0”: (a) Change of ferroelectric cell 1 polarization intensity; (b) change of sense amplifier output signal.
    Transient effects of a single-particle incident sensible amplifier input tube when reading and writing “1”: (a) Change of ferroelectric transistor polarization intensity; (b) change of sense amplifier output signal.
    Signal change of ferroelectric memory cell cell 1 under single-particle HZO ferroelectric thin film with different remanent polarization and coercive field: (a) Change of ferroelectric transistor polarization intensity; (b) change of sense amplifier output signal.
    Transient effects of two single-particle incident read and write “1” ferroelectric storage tube drain: (a) Change of drain current pulse; (b) change of cell 1 polarization intensity; (c) change of sense amplifier output signal.
    Transient effects of two single-particle incident read and write “0” ferroelectric storage tube drain: (a) Change of cell 1 polarization intensity; (b) change of sense amplifier output signal.
    • Table 1. Process parameters of HfO2-FeFET.

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      Table 1. Process parameters of HfO2-FeFET.

      参数数值
      多晶硅厚度/nm20
      栅氧层厚度/nm1
      铁电层厚度/nm10
      沟道长度/nm45
      N型衬底浓度/cm–31 × 1016
      N阱浓度/cm–35 × 1016
      源/漏浓度/cm–32 × 1020
      阈值电压掺杂浓度/cm–35 × 1017
      饱和极化值Ps/μC·cm–228
      剩余极化值Pr/μC·cm–223
      矫顽场强度Ec/MV·cm–11
      介电常数Eps22
    • Table 2.

      Voltage difference change between Out 1 and Out 2.

      输出端Out 1和Out 2之间的电位差变化

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      Table 2.

      Voltage difference change between Out 1 and Out 2.

      输出端Out 1和Out 2之间的电位差变化

      LET值/MeV·cm2·mg–1
      0102030120150180
      电压差/V1.91.851.71.210.950.9
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    Hua-Mei Li, Peng-Fei Hou, Jin-Bin Wang, Hong-Jia Song, Xiang-Li Zhong. Single-event-upset effect simulation of HfO2-based ferroelectric field effect transistor read and write circuits [J]. Acta Physica Sinica, 2020, 69(9): 098502-1

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    Paper Information

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    Received: Jan. 16, 2020

    Accepted: --

    Published Online: Nov. 26, 2020

    The Author Email: Zhong Xiang-Li (xlzhong@xtu.edu.cn)

    DOI:10.7498/aps.69.20200123

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