Optics and Precision Engineering, Volume. 18, Issue 1, 94(2010)

Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution

SHENG Bin*... XU Xiang-dong, LIU Ying, HONG Yi-lin and FU Shao-jun |Show fewer author(s)
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    References(15)

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    [2] [2] TSANG W T, WANG S. Preferentially etched diffraction gratings in silicon [J]. J. Appl. Phys., 1975,46(5):2163-2166.

    [3] [3] FUJII Y, AOYAMA K I, MINOWA J I. Optical demultiplexer using a silicon echelette grating [J]. IEEE J. Quantum Electron, 1980,QE-16:165-169.

    [5] [5] ZHAO B, QI X D. Manufacturing for high efficient holographic diffraction gratings [J]. Opt. Precision Eng., 2001,9(2):109-114. (in Chinese)

    [6] [6] FRANKE A E, SCHATTENBURG M L, GULLIKSON E M, et al.. Super-smooth X-ray reflection grating fabrication [J]. J. Vac. Sci. Technol. B, 1997,15(6):2940-2945.

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    SHENG Bin, XU Xiang-dong, LIU Ying, HONG Yi-lin, FU Shao-jun. Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution[J]. Optics and Precision Engineering, 2010, 18(1): 94

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    Paper Information

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    Received: May. 25, 2009

    Accepted: --

    Published Online: Aug. 31, 2010

    The Author Email: Bin SHENG (bsheng@ustc.edu.cn)

    DOI:

    CSTR:32186.14.

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