In combination with holographic interferometry and the photoresist ashing, a straight and clean photoresist mask with a small line-to-period was fabricated on off-cut silicon (111) wafers. Then,the wet etching method was used to transfer the grating mask pattern on the native oxide layer as the mask of anisotropic etching to obtain the near-ideal grooves of sawtooth. With the blazed grating profile well controlled by this technique, a 1 200 gr/mm blazed grating with a blaze angle of 5.0° and smooth blaze facets about 0.2 nm (RMS) was fabricated. An atomic force microscopy was used to analyze the grating surface,results show that the surface roughness(RMS) is about 0.2 nm,and the diffraction efficiency measurement for the grating shows that the grating can offer excellent blaze properties at the wavelength of 135 nm. It is concluded that high-groove-efficiency blazed gratings used in the vacuum ultraviolet and soft X-ray wavelengths can be easily fabricated by this method at normal or near-normal incidences.