Fig. 1. Schematic diagram of plasma processing

Fig. 2. Structure diagram of different generators

Fig. 3. Main research contents of key technology of plasma processing

Fig. 4. Basic logic of plasma simulation modeling

Fig. 5. Diagram of dominant chemical reaction and constituents of CF₄ plasma excitation

Fig. 6. Three propagation modes of ICP emission flame

Fig. 7. Split rectangular tube model and physical drawing

Fig. 8. Schematic diagram of surface reaction chemical mechanism for SiO₂ etching by fluorocarbon plasma

Fig. 9. Schematic diagram of plasma processing for removal of surface and subsurface damage

Fig. 10. Analysis of jet impingement on surface of components and heat flux distribution on wall

Fig. 11. Comparison of conventional removal function and nonlinear time-varying removal function

Fig. 12. Main factors for modeling of thermal effect of plasma processing

Fig. 13. Schematic diagram of plasma-assisted monocrystal diamond polishing device

Fig. 14. Full-aperture immersion plasma processing technology