Journal of Applied Optics, Volume. 43, Issue 3, 359(2022)

Research status of key technologies in plasma optics fabrication

Peiqi JIAO, Qiang XIN, Xiang WU, Yongqian WU*, Bin FAN, and Qiang CHEN
Author Affiliations
  • Institute of Optics and Electronics, University of Chinese Academy of Sciences, Chengdu 610209, China
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    The plasma processing technology is an advanced optics fabrication technology developed in recent years, which has the advantages of quickly mitigating or removing surface/subsurface damage caused by traditional optics fabrication methods, and trimming optical surfaces with high efficiency, high precision and high resolution. Starting from the basic principle of plasma optical processing, the generator was briefly introduced based on the excitation frequency and characteristics of the plasma. The research contents and achievements of key technologies such as jet characteristics, interface physicochemical reaction, damage removal mechanism, removal function, processing thermal effect and process positioning involved in plasma processing technology by various research institutions were analyzed, and the new optical processing technology of plasma was introduced. With the continuous deepening of research, a plasma processing model under the combined action of multi-physics field and chemical reactions was constructed to reveal the intrinsic relationship between the distribution of surface plasma characteristics and the removal function, so as to establish an accurate removal function model, which is the development direction of improving the modification accuracy. The research on thermal effect control methods and compensation strategies plays an important role in reducing the modification error caused by thermal effects.

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    Peiqi JIAO, Qiang XIN, Xiang WU, Yongqian WU, Bin FAN, Qiang CHEN. Research status of key technologies in plasma optics fabrication[J]. Journal of Applied Optics, 2022, 43(3): 359

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    Paper Information

    Category: REVIEWS

    Received: Feb. 23, 2022

    Accepted: --

    Published Online: Jun. 7, 2022

    The Author Email: WU Yongqian (wyq95111@sina.com)

    DOI:10.5768/JAO202243.0309001

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