Infrared and Laser Engineering, Volume. 52, Issue 8, 20230390(2023)

Research progress of AlGaN-based DUV μLED (invited)

Zhaoqiang Liu1,2,3, Tong Jia1,2,3, Xiangyu Xu1,2,3, Chunshuang Chu1,2,3, Yonghui Zhang1,2,3, and Zihui Zhang1,2,3、*
Author Affiliations
  • 1School of Electronic and Information Engineering, Hebei University of Technology, Tianjin 300401, China
  • 2Tianjin Key Laboratory of Electronic Materials and Devices, Hebei University of Technology, Tianjin 300401, China
  • 3Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
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    Figures & Tables(12)
    Typical epitaxial structure diagram of DUV LED devices
    (a) Size-dependent I–V characteristics curves; (b) Size dependence of current density under the same voltage[44]; (c) LEDs A, B, C with sidewall damages (The usable area ratios for LEDs A, B and C are 85%, 75% and 36%[45])
    Relationship between light extraction efficiency and size of TM polarized light simulated in FDTD
    (a) Light output power as a function of injection current for the DUV LEDs with different mesa sizes; (b) Size dependence of optical power density[44] ; (c) Light output power and (d) the LEE enhancement factor of the DUV LEDs at different currents for the three investigated devices[52]
    (a) Structure diagram of deep ultraviolet LED with meshed p-GaN; (b) LEEs for DUV LED with the meshed p-GaN contacts as a function of the spacing of nanorods; (c) Relationship between LEE and nanorod spacing of DUV LEDs with meshed p-GaN and truncated p-AlGaN contacts[59]; (d) Schematics of the mesh p-GaN/ITO DUV LED; (e) Measured L–I characteristics and I–V characteristics of the two kinds of DUV LEDs[60]
    (a) Schematic cross-sectional view of reference device, Device 1 and Device 2; (b) Current-voltage characteristics for reference device, Devices 1 and Device 2[64]
    (a) Structure diagram of DUV LED with n-AlGaN nanostructure array on Ga surface; (b) TE polarized XY cross section electric field distribution of traditional device (left) and surface finish Ga plane n-AlGaN device (right)[67]
    Schematic of (a) the Ref. DUV LEDs and (b) CSG DUV LEDs [74]; (c) Schematic diagram and SEM image of device structure with inclined and vertical sidewalls; (d) Output power density under different current densities for 20 µm-diameter LEDs (solid lines) and 40 µm-diameter LEDs (dashed-dotted lines) with vertical and inclined sidewalls[75]
    (a) Four difference structures DUV LEDs; the XY cross section electric field profile of TM-polarized light for (b) Device 1; (c) Device 2; (d) Device 3 [79]
    (a) Schematic of the various ODR devices in cross-section view; (b) Enhancement factors for LEE, voltage, and WPE of various ODRs [80]
    (a) Schematic diagrams for MIS-structured DUV LED, i.e., Device A; Calculated energy band diagrams of (b) n-AlGaN layer and n-electrode metal for Device R; (c) n-AlGaN layer, insulator, and n-electrode metal for Device A[84]
    • Table 1. Development of UV communication with LED as a light source

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      Table 1. Development of UV communication with LED as a light source

      YearBandwidth/MHzModulation schemeDistance/mData rateRef.
      2022 2022 2021 960 915 452 OFDM OFDM OFDM 10 17 0.5 6.50 Gb/s >4 Gb/s 2 Gb/s [29] [28] [27]
      2020170PAM-1612.4 Gb/s[30]
      2020170PAM-1651.09 Gb/s[31]
      2019438OFDM0.31.1 Gb/s[26]
      2019153-1.51.18 Gb/s[32]
      2018153PAM-41.61.6 Gb/s[2]
      20181.9-150921.6 Kb/s[33]
      201820OOK-1.92 Mb/s[34]
      201729OFDM-71 Mb/s[35]
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    Zhaoqiang Liu, Tong Jia, Xiangyu Xu, Chunshuang Chu, Yonghui Zhang, Zihui Zhang. Research progress of AlGaN-based DUV μLED (invited)[J]. Infrared and Laser Engineering, 2023, 52(8): 20230390

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    Paper Information

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    Received: May. 12, 2023

    Accepted: --

    Published Online: Oct. 19, 2023

    The Author Email: Zhang Zihui (zh.zhang@hebut.edu.cn)

    DOI:10.3788/IRLA20230390

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